发明名称 MASK FOR LITHOGRAPHY AND APPARATUS FOR LITHOGRAPHY INCLUDING THE SAME
摘要 A light exposure mask is used for the exposure of an object to be exposed to light, wherein object marks are indicated in the object. The light exposure mask includes: a plate-shaped mask body; and alignment masks formed in the mask body at positions corresponding to the object marks in order to be aligned with the object marks. The alignment masks are penetrating holes which are formed by punching the mask body in order to allow the object marks to be visible when the mask body is laid on the object to be exposed to light. The alignment masks of the light exposure mask are composed of penetrating holes in order to be aligned with the marks (or keys) of the object to be exposed to light. Therefore, the marks of the object to be exposed to light can be clearly visible regardless of material for the light exposure mask so materials for the light exposure mask can be variously selected. Accordingly, with regard to a light exposure process for the formation of a transparent conductive pattern of a touch panel, a high-priced glass mask which has been used due to a visibility problem can be replaced by a low-priced polymer film mask, thereby enhancing productivity and greatly reducing manufacturing costs.
申请公布号 KR20140108370(A) 申请公布日期 2014.09.11
申请号 KR20130019928 申请日期 2013.02.25
申请人 ILJIN DISPLAY CO., LTD. 发明人 HWANG, JI EUN;KIM, SEUNG YONG;KIM, KI HWAN;SUNG, YEON JO
分类号 G03F1/38;G03F7/20 主分类号 G03F1/38
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