EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM

摘要

An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the first being disposed at at least a portion of surrounding of the optical member, the second being disposed at at least a portion of surrounding of an optical path of the exposure light below the first member, being movable with respect to the first member and including a second upper and lower surface, the second upper surface being opposite a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, which is movable below the optical member; and a vibration isolator configured to suppress a vibration of the first member.

主权项

1. An exposure apparatus that exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate, the exposure apparatus comprising:
a liquid immersion member configured to form an immersion liquid space on an object and comprising a first member and a second member, the first member being disposed at at least a portion of surrounding of the optical member, the second member being disposed at at least a portion of surrounding of an optical path of the exposure light below of the first member, being movable with respect to the first member and comprising a second upper surface and a second lower surface, the second upper surface being opposite to a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, the object being movable below of the optical member; and a vibration isolator configured to suppress a vibration of the first member.