MICROWAVE PLASMA REACTOR AND SUBSTRATE FOR MANUFACTURING SYNTHETIC DIAMOND

摘要

PROBLEM TO BE SOLVED: To provide a substrate used for a microwave plasma reactor.SOLUTION: A microwave plasma reactor comprises: a microwave generator configured to generate microwaves of a frequency f; a plasma chamber having a bottom part, a top plate, and a side wall extending from the bottom part to the top plate, and constituting a hollow resonator supporting a microwave resonance mode between the bottom part and the top plate; a microwave coupling structure body for transmitting the microwaves from the microwave generator into the plasma chamber; a gas flow system for removing process gas from the plasma chamber; a substrate holder provided in the plasma chamber and having a supporting face supporting the substrate; and a substrate provided on the supporting face. The substrate has a growth face for precipitating a synthetic diamond material during usage, and dimension and an arrangement place of the substrate in the hollow resonator are selected to generate a local axis symmetrical Eelectric field profile across the growth face during usage.