发明名称 FIELD EFFECT TRANSISTOR DEVICE
摘要 A semi-metallic structure, comprising an LaAlO3—SrTiO3 heterostructure (19), said LaAlO3—SrTiO3 heterostructure comprising a two-dimensional hole gas (21) and a two-dimensional electron gas (23).
申请公布号 US2014253183(A1) 申请公布日期 2014.09.11
申请号 US201414198987 申请日期 2014.03.06
申请人 Kabushiki Kaisha Toshiba 发明人 HOLMES Stuart N.
分类号 H01L29/24;H01L29/778;H03K3/01;H01L29/66 主分类号 H01L29/24
代理机构 代理人
主权项 1. A semi-metallic structure, comprising an LaAlO3—SrTiO3 heterostructure (19),said LaAlO3—SrTiO3 heterostructure comprising a two-dimensional hole gas (21) and a two-dimensional electron gas (23).
地址 Minato-ku JP