发明名称 |
Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck |
摘要 |
A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40,42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid. |
申请公布号 |
US2014253900(A1) |
申请公布日期 |
2014.09.11 |
申请号 |
US201214349900 |
申请日期 |
2012.09.19 |
申请人 |
ASML Netherlands B.V. |
发明人 |
Cornelissen Sebastiaan Maria Johannes;Gilissen Noud Jan;Sijben Anko Jozef Cornelus;Schmitz Roger Wilhelmus Antonius Henricus;Notenboom Arnoud Willem;Van Der Wilk Ronald;Will Manon Elise |
分类号 |
G03F7/20;H01L21/683 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
1. A chuck for use in holding a patterning device or a substrate onto a supporting table of a lithography apparatus by electrostatic force, in which the patterning device is for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam, wherein the chuck comprises:
a dielectric member; a temperature conditioning fluid channel formed within the dielectric member; and a drive electrode configured to apply a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode configured to reduce or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid. |
地址 |
Veldhoven NL |