发明名称 Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck
摘要 A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40,42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.
申请公布号 US2014253900(A1) 申请公布日期 2014.09.11
申请号 US201214349900 申请日期 2012.09.19
申请人 ASML Netherlands B.V. 发明人 Cornelissen Sebastiaan Maria Johannes;Gilissen Noud Jan;Sijben Anko Jozef Cornelus;Schmitz Roger Wilhelmus Antonius Henricus;Notenboom Arnoud Willem;Van Der Wilk Ronald;Will Manon Elise
分类号 G03F7/20;H01L21/683 主分类号 G03F7/20
代理机构 代理人
主权项 1. A chuck for use in holding a patterning device or a substrate onto a supporting table of a lithography apparatus by electrostatic force, in which the patterning device is for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam, wherein the chuck comprises: a dielectric member; a temperature conditioning fluid channel formed within the dielectric member; and a drive electrode configured to apply a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode configured to reduce or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.
地址 Veldhoven NL