发明名称 |
SUSCEPTOR SUPPORT SHAFT FOR IMPROVED WAFER TEMPERATURE UNIFORMITY AND PROCESS REPEATABILITY |
摘要 |
Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber. |
申请公布号 |
US2014251208(A1) |
申请公布日期 |
2014.09.11 |
申请号 |
US201414182634 |
申请日期 |
2014.02.18 |
申请人 |
Applied Materials, Inc. |
发明人 |
SAMIR MEHMET TUGRUL;Lau Shu-Kwan |
分类号 |
B05C13/00 |
主分类号 |
B05C13/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A susceptor support shaft for a process chamber, comprising:
a cylindrical support shaft; and a support body coupled the support shaft, the support body comprising:
a hub;a plurality of tapered bases extending from the hub;at least three support arms extending from some of the tapered bases; andat least three dummy arms extending from some of the tapered bases. |
地址 |
Santa Clara CA US |