发明名称 Parasitic Capacitance Extraction for FinFETs
摘要 A method includes generating a three-dimensional table. The table cells of the three-dimensional table comprise normalized parasitic capacitance values selected from the group consisting essentially of normalized poly-to-fin parasitic capacitance values and normalized poly-to-metal-contact parasitic capacitance values of Fin Field-Effect Transistors (FinFETs). The three-dimensional table is indexed by poly-to-metal-contact spacings of the FinFETs, fin-to-fin spacings of the FinFETs, and metal-contact-to-second-poly spacings of the FinFETs. The step of generating the three-dimensional table is performed using a computer.
申请公布号 US2014258962(A1) 申请公布日期 2014.09.11
申请号 US201313873969 申请日期 2013.04.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Ho Chia-Ming;Su Ke-Ying;Chao Hsiao-Shu;Cheng Yi-Kan;Wu Ze-Ming;Lee Hsien-Hsin Sean
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
主权项 1. A method comprising: generating a three-dimensional table, wherein table cells of the three-dimensional table comprise normalized parasitic capacitance values selected from a group consisting essentially of normalized poly-to-fin parasitic capacitance values and normalized poly-to-metal-contact parasitic capacitance values of Fin Field-Effect Transistors (FinFETs), and wherein the three-dimensional table is indexed by: poly-to-metal-contact spacings of the FinFETs;fin-to-fin spacings of the FinFETs; andmetal-contact-to-second-poly spacings of the FinFETs, wherein the step of generating the three-dimensional table is performed using a computer.
地址 Hsin-Chu TW