APPARATUS AND METHODS FOR FABRICATING A PHOTOMASK SUBSTRATE FOR EUV APPLICATIONS

摘要

An apparatus and methods utilized a DC or AC power to supply through a conductive substrate support pedestal to a conductive photomask substrate during a photomask substrate manufacturing process for EUV or other advanced lithography applications are provided. In one embodiment, an apparatus for processing a photomask includes a substrate support pedestal configured to receive a conductive photomask, wherein the conductive photomask is fabricated from a dielectric material substrate with a conductive coating, and at least a conductive path formed in the substrate support pedestal in contact with the photomask substrate configured to be conductive.

主权项

1. A method for etching a photomask for lithographic applications, comprising:
providing a conductive photomask on a substrate support pedestal disposed in a plasma processing chamber, wherein the conductive photomask is fabricated from a dielectric material substrate with a conductive coating; supplying a gas mixture into the processing chamber; and applying a DC or AC power through a conductive path formed in the substrate support pedestal to the conductive photomask during etching, wherein the substrate conductive path in the substrate support pedestal allows DC or AC power to pass therethrough to the conductive photomask.