发明名称 SCATTERING ENHANCED THIN ABSORBER FOR EUV REFLECTIVE RETICLE AND A METHOD OF MAKING
摘要 A scattering enhanced thin absorber for a EUV reticle and a method of making thereof is disclosed. Embodiments include forming a multilayer on the upper surface of a substrate, forming a capping layer over the multilayer, forming one or more diffuse scattering layers over the capping layer, and etching the diffuse scattering layers to form a stack.
申请公布号 US2014254018(A1) 申请公布日期 2014.09.11
申请号 US201313790727 申请日期 2013.03.08
申请人 SUN Lei;Wood, II Obert Reeves 发明人 SUN Lei;Wood, II Obert Reeves
分类号 G02B5/02 主分类号 G02B5/02
代理机构 代理人
主权项 1. A method comprising: forming a multilayer on an upper surface of a substrate; forming a capping layer over the multilayer; forming one or more diffuse scattering layers over the capping layer; and etching the diffuse scattering layers to form a stack.
地址 Albany NY US