发明名称 |
SCATTERING ENHANCED THIN ABSORBER FOR EUV REFLECTIVE RETICLE AND A METHOD OF MAKING |
摘要 |
A scattering enhanced thin absorber for a EUV reticle and a method of making thereof is disclosed. Embodiments include forming a multilayer on the upper surface of a substrate, forming a capping layer over the multilayer, forming one or more diffuse scattering layers over the capping layer, and etching the diffuse scattering layers to form a stack. |
申请公布号 |
US2014254018(A1) |
申请公布日期 |
2014.09.11 |
申请号 |
US201313790727 |
申请日期 |
2013.03.08 |
申请人 |
SUN Lei;Wood, II Obert Reeves |
发明人 |
SUN Lei;Wood, II Obert Reeves |
分类号 |
G02B5/02 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
forming a multilayer on an upper surface of a substrate; forming a capping layer over the multilayer; forming one or more diffuse scattering layers over the capping layer; and etching the diffuse scattering layers to form a stack. |
地址 |
Albany NY US |