发明名称 SIMULTANEOUS AND SELECTIVE WIDE GAP PARTITIONING OF VIA STRUCTURES USING PLATING RESIST
摘要 A multilayer printed circuit board is provided having a first dielectric layer and a first plating resist selectively positioned in the first dielectric layer. A second plating resist may be selectively positioned in the first dielectric layer or a second dielectric layer, the second plating resist separate from the first plating resist. A through hole extends through the first dielectric layer, the first plating resist, and the second plating resist. An interior surface of the through hole is plated with a conductive material except along a length between the first plating resist and the second plating resist. This forms a partitioned plated through hole having a first via segment electrically isolated from a second via segment.
申请公布号 US2014251663(A1) 申请公布日期 2014.09.11
申请号 US201414205337 申请日期 2014.03.11
申请人 Sanmina Corporation 发明人 Iketani Shinichi;Kersten Dale;Dudnikov, Jr. George
分类号 H05K1/11 主分类号 H05K1/11
代理机构 代理人
主权项 1. A multilayer printed circuit board, comprising: a first dielectric layer; a first plating resist selectively positioned in the first dielectric layer; a second plating resist selectively positioned in the first dielectric layer or a second dielectric layer, the second plating resist separate from the first plating resist; and a through hole extending through the first dielectric layer, the first plating resist, and the second plating resist, where an interior surface of the through hole is plated with a conductive material except along a length between the first plating resist and the second plating resist to form a partitioned plated through hole having a first via segment electrically isolated from a second via segment.
地址 San Jose CA US