| 摘要 |
PROBLEM TO BE SOLVED: To provide an oxide sputtering target for forming an optical recording medium protective film, which induces no cracks and causes no elution of In to simplify a manufacturing process, and provides a high density, and manufacturing method of the target.SOLUTION: An oxide sputtering target consists of Zr,In,Ga,Zn and oxygen, and has a structure where a ZrOphase surrounded by a phase including a complex oxide phase consisting of In, Zn, and Ga oxides. Preferably, if atomic ratios to the total metal component content excluding inevitable impurities are defined as Zr:A%, In:B%, Ga:C%, and Zn:D%, these component contents satisfy relations: 0<A≤45.5, 9.1≤B≤31.0, 9.1≤C≤31.0, B+C≤2D, and A+B+C+D=100. |
