| 摘要 |
PROBLEM TO BE SOLVED: To efficiently supply radicals on a substrate in a film deposition device for depositing a film on a substrate being conveyed using plasma ALD.SOLUTION: A film deposition device has a film deposition container, a conveying mechanism for conveying a substrate, plural plasma generation electrode plates, and injectors. The plasma generation electrode plate is an electrode plate provided along a substrate conveying path. Respective main surfaces of the electrode plates are opposed to a face of the substrate, and a current flows in a direction transverse to the substrate conveying path to form a magnetic field and generate a plasma. The injectors are spaced along the conveying path between the plasma generation electrode plate and the conveying path, so that radicals generated from the plasma are supplied to the substrate. The injectors respectively supply film depositing gas toward the substrate. Respective transverse portions of the plasma generation electrode plates at which the current flows to form the magnetic field are provided at the same positions as intervals between the injectors relative to a position along a conveying direction. |
