发明名称 |
METHOD FOR FABRICATING A PATTERNED SUBSTRATE FOR A CELL CULTURE, A PATTERNED SUBSTRATE FOR CELL CULTURE, AND A CELL CHIP |
摘要 |
The present invention relates to a method for fabricating a patterned substrate for a cell culture, comprising the steps of: (1) preparing a substrate; (2) depositing a plasma polymer layer by using a precursor material on the substrate; (3) placing a shadow mask having a predetermined pattern on the plasma polymer layer; (4) treating the substrate, having the shadow mask placed thereon, with a reactive gas using plasma; and (5) removing the shadow mask from the substrate, and a patterned substrate for the cell culture fabricated thereby. The invention also relates to a method for a cell culture with a pattern, comprising the step of culturing cells on the patterned substrate for the cell culture, and a patterned cell chip, and a method of screening a material having an activity of inducing or promoting angiogenesis using the patterned cell chip. |
申请公布号 |
US2014255968(A1) |
申请公布日期 |
2014.09.11 |
申请号 |
US201414183961 |
申请日期 |
2014.02.19 |
申请人 |
RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY |
发明人 |
JUNG Dong Geun;HA Myung Hoon;PARK Heon Yong;PARK Ji Soo;LEE Hye Rim |
分类号 |
C12N5/00;G01N33/50 |
主分类号 |
C12N5/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating a patterned substrate for a cell culture, comprising the steps of:
(1) preparing a substrate; (2) depositing a plasma polymer layer by using a precursor material on the substrate; (3) placing a shadow mask having a predetermined pattern on the plasma polymer layer; (4) treating the substrate, having the shadow mask placed thereon, with a reactive gas using plasma; and (5) removing the shadow mask from the substrate. |
地址 |
Suwon-si KR |