发明名称 METHOD FOR FABRICATING A PATTERNED SUBSTRATE FOR A CELL CULTURE, A PATTERNED SUBSTRATE FOR CELL CULTURE, AND A CELL CHIP
摘要 The present invention relates to a method for fabricating a patterned substrate for a cell culture, comprising the steps of: (1) preparing a substrate; (2) depositing a plasma polymer layer by using a precursor material on the substrate; (3) placing a shadow mask having a predetermined pattern on the plasma polymer layer; (4) treating the substrate, having the shadow mask placed thereon, with a reactive gas using plasma; and (5) removing the shadow mask from the substrate, and a patterned substrate for the cell culture fabricated thereby. The invention also relates to a method for a cell culture with a pattern, comprising the step of culturing cells on the patterned substrate for the cell culture, and a patterned cell chip, and a method of screening a material having an activity of inducing or promoting angiogenesis using the patterned cell chip.
申请公布号 US2014255968(A1) 申请公布日期 2014.09.11
申请号 US201414183961 申请日期 2014.02.19
申请人 RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY 发明人 JUNG Dong Geun;HA Myung Hoon;PARK Heon Yong;PARK Ji Soo;LEE Hye Rim
分类号 C12N5/00;G01N33/50 主分类号 C12N5/00
代理机构 代理人
主权项 1. A method for fabricating a patterned substrate for a cell culture, comprising the steps of: (1) preparing a substrate; (2) depositing a plasma polymer layer by using a precursor material on the substrate; (3) placing a shadow mask having a predetermined pattern on the plasma polymer layer; (4) treating the substrate, having the shadow mask placed thereon, with a reactive gas using plasma; and (5) removing the shadow mask from the substrate.
地址 Suwon-si KR