| 发明名称 |
MASK SET FOR DOUBLE EXPOSURE PROCESS AND METHOD OF USING THE MASK SET |
| 摘要 |
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth. |
| 申请公布号 |
US2014258946(A1) |
申请公布日期 |
2014.09.11 |
| 申请号 |
US201414287079 |
申请日期 |
2014.05.26 |
| 申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
Kuo Hui-Fang;Chen Ming-Jui;Tseng Ting-Cheng;Wang Cheng-Te |
| 分类号 |
G06F17/50;G03F1/00 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask set for double exposure process, comprising:
a first mask having a first mask pattern, said first mask pattern is provided with a first base and a plurality of first teeth and protruding portions extending from said first base and alternatively aligning along a first direction; and a second mask having a second mask pattern, said second mask pattern is provided with a second base and a plurality of second teeth extending from said second base, wherein said second base may at least partially overlap said first base so that each of said protruding portions at least partially overlaps one of said second teeth. |
| 地址 |
Hsin-Chu City TW |
