Implant, and method and system for producing such an implant

摘要

An implant and a method of producing the implant are provided. The implant can have at least one outer surface extending in its longitudinal direction. The implant can comprise an underlying wave pattern, an intermediate wave pattern, and a microscopic roughening layer. The underlying wave pattern can have waves that extend substantially in the longitudinal direction. Further, the intermediate wave pattern can be formed on the waves of the underlying wave pattern. Additionally, the microscopic roughening layer can be formed on top of the underlying wave pattern.

主权项

1. An implant with at least one outer surface extending in its longitudinal direction, comprising:
an underlying wave pattern with waves that extend substantially in said longitudinal direction; an intermediate wave pattern formed on the waves of the underlying wave pattern, the intermediate wave pattern having a depth of between approximately 25 to 200 μm; and a microscopic roughening layer formed on top of said underlying wave pattern.