发明名称 Self-oscillating semiconductor laser device and driving method thereof
摘要 There is provided a driving method of a self-oscillating semiconductor laser device including a first compound semiconductor layer having a first conductive type and composed of a GaN base compound semiconductor, a third compound semiconductor layer and a second compound semiconductor layer configuring an emission region and a saturable absorption region, are successively laminated, a second electrode formed on the second compound semiconductor layer, and a first electrode electrically connected to the first compound semiconductor layer. The second electrode is separated into a first portion to create a forward bias state by passing current to the first electrode via the emission region and a second portion to apply an electric field to the saturable absorption region by a separation groove. The current greater than a current value where kink is occurred in optical output-current characteristics is to be passed to the first portion of the second electrode.
申请公布号 US8831055(B2) 申请公布日期 2014.09.09
申请号 US201113035585 申请日期 2011.02.25
申请人 Sony Corporation 发明人 Watanabe Hideki;Kuramoto Masaru;Miyajima Takao;Yokoyama Hiroyuki
分类号 H01S3/13;H01S5/30;H01S5/343 主分类号 H01S3/13
代理机构 K&L Gates LLP 代理人 K&L Gates LLP
主权项 1. A driving method of a self-oscillating semiconductor laser device comprising: (a) a laminated structure in which a first compound semiconductor layer having a first conductive type and composed of a GaN base compound semiconductor, a third compound semiconductor layer configuring an emission region and a saturable absorption region composed of the GaN base compound semiconductor, and a second compound semiconductor layer having a second conductive type that is different from the first conductive type and composed of the GaN base compound semiconductor are successively laminated; (b) a second electrode formed on the second compound semiconductor layer, wherein a region of the second compound semiconductor layer apart from the third compound semiconductor layer is mounted with an electron barrier layer having a thickness higher than 10 nm and a distance between the electron barrier layer and the third compound semiconductor layer is 4.5×10−8 m or more and 8×10−8 m or less; and (c) a first electrode electrically connected to the first compound semiconductor layer, wherein the second electrode is separated into a first portion to create a forward bias state by passing current to the first electrode via the emission region and a second portion to apply an electric field to the saturable absorption region by a separation groove, the method including passing a current greater than a current value where kink is occurred in optical output-current characteristics is to be passed to the first portion of the second electrode.
地址 Tokyo JP