Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid

摘要

A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.

主权项

1. A method for cleaning a semiconductor structure, the method comprising:
holding the semiconductor structure; introducing a dense phase fluid onto the semiconductor structure; thermally cycling at least part of the semiconductor structure through a predetermined temperature range by thermally regulating a thermal input to the semiconductor structure, and causing a substantially immediate thermal response in thermal input to the semiconductor structure to thermal regulating changes during thermal cycling.