发明名称 Power semiconductor device
摘要 Provided is a power semiconductor device including a semiconductor substrate, in which a current flows in a thickness direction of the semiconductor substrate. The semiconductor substrate includes a resistance control structure configured so that a resistance to the current becomes higher in a central portion of the semiconductor substrate than a peripheral portion of the semiconductor substrate.
申请公布号 US8829600(B2) 申请公布日期 2014.09.09
申请号 US201313753674 申请日期 2013.01.30
申请人 Mitsubishi Electric Corporation 发明人 Hatori Kenji
分类号 H01L29/76;H01L29/739;H01L29/08;H01L29/06;H01L29/36 主分类号 H01L29/76
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A power semiconductor device comprising a semiconductor substrate in which current flows in a thickness direction of said semiconductor substrate, wherein said semiconductor substrate includes: a first semiconductor layer of a first conductivity type which extends laterally to run across a central portion of said semiconductor substrate and a peripheral portion of said semiconductor substrate laterally surrounding said central portion; and a second semiconductor layer of a second conductivity type which faces said first semiconductor layer in said thickness direction; said second semiconductor layer has a form to be located in said peripheral portion but not located in said central portion; and said second semiconductor layer provides a resistance control structure having a resistance to current higher in said central portion than said peripheral portion.
地址 Tokyo JP