发明名称 |
Power semiconductor device |
摘要 |
Provided is a power semiconductor device including a semiconductor substrate, in which a current flows in a thickness direction of the semiconductor substrate. The semiconductor substrate includes a resistance control structure configured so that a resistance to the current becomes higher in a central portion of the semiconductor substrate than a peripheral portion of the semiconductor substrate. |
申请公布号 |
US8829600(B2) |
申请公布日期 |
2014.09.09 |
申请号 |
US201313753674 |
申请日期 |
2013.01.30 |
申请人 |
Mitsubishi Electric Corporation |
发明人 |
Hatori Kenji |
分类号 |
H01L29/76;H01L29/739;H01L29/08;H01L29/06;H01L29/36 |
主分类号 |
H01L29/76 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A power semiconductor device comprising a semiconductor substrate in which current flows in a thickness direction of said semiconductor substrate,
wherein said semiconductor substrate includes: a first semiconductor layer of a first conductivity type which extends laterally to run across a central portion of said semiconductor substrate and a peripheral portion of said semiconductor substrate laterally surrounding said central portion; and a second semiconductor layer of a second conductivity type which faces said first semiconductor layer in said thickness direction; said second semiconductor layer has a form to be located in said peripheral portion but not located in said central portion; and said second semiconductor layer provides a resistance control structure having a resistance to current higher in said central portion than said peripheral portion. |
地址 |
Tokyo JP |