| 摘要 |
An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40. |
| 主权项 |
1. An exposure method for a color filter substrate having: a rectangular display region which has a pair of sides extending in a first direction and a pair of sides extending in a second direction orthogonal to the first direction and in which a plurality of colored pixels and a plurality of photo spacers (PSs) are provided; a pair of first non-display regions which are respectively along the sides extending in the first direction and in which a plurality of dummy photo spacers (dummy PSs) are provided; and a pair of second non-display regions which are respectively along the sides extending in the second direction and in which a plurality of dummy photo spacers (dummy PSs) are provided, the exposure method comprising:
forming, in the first non-display region, a first layer composed of the same material as a colored pixel of a first color and included in a first dummy PS, by intermittently performing exposure a plurality of times on a substrate to which a photoresist of the first color has been applied while transporting the substrate in the first direction; forming, in the second non-display region, a second layer composed of the same material as a colored pixel of a second color and included in a second dummy PS, by intermittently performing exposure a plurality of times on the substrate to which a photoresist of the second color has been applied while transporting the substrate in the first direction; forming a third layer stacked together with the first layer in the first non-display region, composed of the same material as a colored pixel of a third color, and included in the first dummy PS, and forming a fourth layer stacked together with the second layer in the second non-display region, composed of the same material as the colored pixel of the third color, and included in the second dummy PS, by performing exposure once on the substrate to which a photoresist of the third color has been applied; and forming a fifth layer stacked together with the first layer and the third layer in the first non-display region, composed of the same material as a colored pixel of a fourth color, and included in the first dummy PS, and forming a sixth layer stacked together with the second layer and the fourth layer in the second non-display region, composed of the same material as the colored pixel of the fourth color, and included in the second dummy PS, by performing exposure once on the substrate to which a photoresist of the fourth color has been applied, wherein the forming the first layer, the forming the second layer, the forming the third layer and the fourth layer, and the forming the fifth layer and the sixth layer are carried out in an arbitrary order. |
