| 发明名称 | Lithographic apparatus and method | ||
| 摘要 | A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate. | ||
| 申请公布号 | US8830444(B2) | 申请公布日期 | 2014.09.09 |
| 申请号 | US201113279770 | 申请日期 | 2011.10.24 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Van Schoot Jan Bernard Plechelmus;Bouchoms Igor Petrus Maria;Van Dijsseldonk Antonius Johannes Josephus;Eurlings Markus Franciscus Antonius |
| 分类号 | G03F7/20;G03B27/54;G03B27/58 | 主分类号 | G03F7/20 |
| 代理机构 | Sterne, Kessler, Goldstein & Fox P.L.L.C. | 代理人 | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| 主权项 | 1. A lithographic apparatus comprising: a source configured to generate a beam of radiation; a support structure configured to supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion; and a control apparatus configured to adjust power of the radiation beam to compensate for effect of the measured relative vibration on the pattern projected onto the substrate. | ||
| 地址 | Veldhoven NL | ||