Circuit device

摘要

The device includes a first inductor, a first insulating layer, a second inductor, and a third inductor. The first inductor includes a helical conductive pattern. The second inductor is located in a region overlapping the first inductor through the first insulating layer. The second inductor includes a helical conductive pattern. The third inductor is connected in series to the second inductor, and includes a helical conductive pattern.

主权项

1. A circuit device, comprising:
a semiconductor substrate; a first inductor provided over said semiconductor substrate; a first interconnect provided over said semiconductor substrate and coupled to said first inductor; a first insulating layer provided over said semiconductor substrate and positioned over or under said first inductor; a second inductor provided over said semiconductor substrate and located in a region overlapping with said first inductor through said first insulating layer when viewed from a direction perpendicular to said semiconductor substrate; a third inductor provided over said semiconductor substrate and coupled to said second inductor; a fourth inductor provided over said semiconductor substrate and overlapping with said third inductor through said second insulating layer or said first insulating layer when viewed from a direction perpendicular to said semiconductor substrate; and a second interconnect provided over said semiconductor substrate and coupled to said fourth inductor, wherein said second inductor and said third inductor are wound in a same direction with each other from respective inner end portions to respective outer end portions thereof, said respective outer end portions being coupled to each other and said respective inner end portions being coupled to each other.