Environmental system including a transport region for an immersion lithography apparatus

摘要

A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

主权项

1. A liquid immersion lithography apparatus comprising:
a projection system having a final optical member; a liquid containment member that surrounds the final optical member of the projection system, a wafer being provided under the final optical member and under the liquid containment member, and the wafer being exposed through an immersion liquid in a first gap between the final optical member and the wafer, the liquid containment member including an open aperture through which the immersion liquid is allowed to move between a lower surface of the final optical member and an upper surface of the wafer, the final optical member is spaced from a portion of the liquid containment member having the open aperture such that a second gap exists between the portion of the liquid containment member having the open aperture and the final optical member; a porous member attached to the liquid containment member, through which the immersion liquid on a first side of the porous member is collected; and a space formed in the liquid containment member, the space being formed on a second side of the porous member which is opposite the first side of the porous member.