发明名称 Method for producing a planographic printing plate
摘要 Provided is a method of producing a planographic printing plate, including: subjecting a planographic printing plate precursor, to image-wise exposure; and developing it using an alkaline aqueous solution which contains a specific compound and has a pH of from 8.5 to 10.8, in this order. The recording layer has: a lower layer containing a water-insoluble and alkali-soluble resin and an infrared ray absorbing agent; and an upper layer containing a water-insoluble and alkali-soluble polyurethane resin and a polyorganosiloxane. The specific compound is a nonionic or anionic surfactant, or at least one compound represented by Formula (1) or (2), wherein R11, R12, and R13 each represent an alkyl group; R14 represents an alkylene group; and R15 represents a single bond or a divalent linking group containing a hetero atom; and R21, R22, and R23 each represent an alkyl group.;
申请公布号 US8828648(B2) 申请公布日期 2014.09.09
申请号 US201113027282 申请日期 2011.02.15
申请人 FUJIFILM Corporation 发明人 Aoshima Norio
分类号 B41M5/00;B41N1/00;G03F7/00;G03F7/26;G03C5/26 主分类号 B41M5/00
代理机构 SOLARIS Intellectual Property Group, PLLC 代理人 SOLARIS Intellectual Property Group, PLLC
主权项 1. A method of making a planographic printing plate, comprising in the following order: subjecting a planographic printing plate precursor, which comprises a support and a positive-working image recording layer provided on the support, to image-wise exposure, the positive-working image recording layer comprising: a lower layer comprising a (A) water-insoluble and alkali-soluble resin and an (B) an infrared ray absorbing agent; and an upper layer comprising a (C) water-insoluble and alkali-soluble polyurethane resin and a (D) polyorganosiloxane; and developing the planographic printing plate precursor using an alkaline aqueous solution which comprises at least one of a compound represented by the following Formula (1) or a compound represented by the following Formula (2) and has a pH of from 8.5 to 10.8: wherein, in Formula (1), R11, R12, and R13 each independently represent an alkyl group; R14 represents an alkylene group; and R15 represents a single bond or a divalent linking group containing a hetero atom; and in Formula (2), R21, R22, and R23 each independently represent an alkyl group.
地址 Tokyo JP