| 发明名称 | Barrier film and method of manufacturing the same | ||
| 摘要 | A barrier film includes a base which is formed of a plastic film having a first surface and a second surface opposed to the first surface, a first barrier layer which is formed on the first surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property; and a second barrier layer which is formed on the second surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property. | ||
| 申请公布号 | US8828528(B2) | 申请公布日期 | 2014.09.09 |
| 申请号 | US201113271434 | 申请日期 | 2011.10.12 |
| 申请人 | Sony Corporation | 发明人 | Yu Andrew Chakchung;Ono Hiroaki;Kawana Takahiro |
| 分类号 | B32B7/02;B32B19/00;C23C16/40;C23C16/455 | 主分类号 | B32B7/02 |
| 代理机构 | K&L Gates LLP | 代理人 | K&L Gates LLP |
| 主权项 | 1. A barrier film comprising: a base which is formed of a plastic film having a first surface and a second surface opposed to the first surface; a first barrier layer which is formed on the first surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property; and a second barrier layer which is formed on the second surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property, wherein the first and second barrier lavers are aluminum oxide films which are formed at a pressure greater than 0.5 Torr and equal to or less than 3 Torr, and wherein the barrier film has a water vapor transmission rate from 10×10−5 to 10−7 [g/m2/day]. | ||
| 地址 | Tokyo JP | ||