发明名称 |
Porous base matrix having formyl group, adsorbent using the porous base matrix, method for production of the porous base matrix, and method for production of the adsorbent |
摘要 |
The present invention relates to a porous base matrix having formyl group, which base matrix has a structure represented by the formula (2) as a spacer, which structure is obtained by cleaving a group represented by the formula (1):;
wherein, R1 represents a group forming a five-membered ring or a six-membered ring with —CH(OH)—CH(OH)—; a method for producing the porous base matrix; and an adsorbent obtained by binding a ligand on the porous base matrix. By the present invention, a high-intensity base matrix for an adsorbent and an adsorbent are provided. The amount of a ligand leaked from the adsorbend is small. |
申请公布号 |
US8828905(B2) |
申请公布日期 |
2014.09.09 |
申请号 |
US200812602001 |
申请日期 |
2008.05.30 |
申请人 |
Kaneka Corporation |
发明人 |
Kawai Yoshikazu;Kawahara Naomi |
分类号 |
B01J20/26;B01J20/32;B01D15/00;C07K1/16;B01J20/289;C07K1/22 |
主分类号 |
B01J20/26 |
代理机构 |
Birch, Stewart, Kolasch & Birch, LLP. |
代理人 |
Birch, Stewart, Kolasch & Birch, LLP. |
主权项 |
1. A method for producing a porous base matrix having a formyl group, comprising steps of
allowing a halohydrin or a bis- or higher-functional epoxy compound to act on a raw material porous base matrix in order to introduce an epoxy group to the raw material porous base matrix, transforming the epoxy group into a glyceryl group, allowing a periodate salt to act on the glyceryl group in order to transform the glyceryl group into a monoformyl group, allowing a five-membered ring sugar containing at least an amino group or a six-membered ring sugar containing at least an amino group to react with the epoxy group and the monoformyl group in order to introduce a group represented by the general formula (1):wherein, R1 represents a group forming the sugar with —CH(OH)—CH(OH)—,
transforming the group (1) with a periodate salt into a group represented by the general formula (2):wherein, R1 is the same as the above. |
地址 |
Osaka JP |