| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a semiconductor device manufacturing method, which can inhibit thermal aberration of a reticle and reduce an overlay error in an exposure device.SOLUTION: A semiconductor manufacturing apparatus of the present embodiment comprises a first optical system and a second optical system. The first optical system irradiates light from a first light source on an original plate and transfers a pattern drawn on the original plate to a substrate. The second optical system irradiates light from a second light source on the original plate in an amount of light corresponding to a density of the pattern drawn on the original plate.</p> |
