发明名称
摘要 An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
申请公布号 JP2014523071(A) 申请公布日期 2014.09.08
申请号 JP20140517161 申请日期 2012.06.21
申请人 发明人
分类号 H01J27/16;H01J37/08;H01J37/317;H05H1/46 主分类号 H01J27/16
代理机构 代理人
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