LITHOGRAPHY SYSTEM, PATTERN FORMING METHOD AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To efficiently exchange data between a plurality of lithography devices or to efficiently implement processing for which huge computational complexity is required, when using the plurality of lithography devices.SOLUTION: A lithography system DMS comprises: an exposure device EXA which includes a data processing section 8A for performing processing relating to a reticle and exposes a wafer via the reticle; an exposure device EXB which includes a data processing section 8B for performing processing relating to the reticle and exposes the wafer via the reticle; and a communication line 12 for transferring, to the data processing section 8B, data acquired by the processing relating to the reticle performed in the data processing section 8A. The data processing section 8B includes a second storage unit 50B for recording therein data transferred by the communication line 12.