| 摘要 |
PROBLEM TO BE SOLVED: To accurately estimate, according to an illuminating condition, the state of diffraction light emitted at a diffraction angle large enough for it not to pass through the aperture diaphragm of a projection optical system from a mask.SOLUTION: A method for estimating the state of diffraction light generated from the pattern of a reticle comprises: a step 102 of setting the light intensity distribution of an illumination pupil; a step 108 of measuring the diffraction intensity distribution in the projection pupil of a projection optical system that forms the image of the pattern of a reticle; steps 110, 112 of obtaining weight coefficients for a plurality of light intensity distributions when the degree of correlation between a diffraction intensity distribution and each of the plurality of light intensity distributions, which are obtained by shifting a 0-order intensity distribution corresponding to the light intensity distribution of illumination pupil, increases; and a step 116 of estimating the state of opening outer diffraction light that does not enter the projection pupil, on the basis of a light intensity distribution outside the projection pupil among light intensity distributions obtained by the weighted sum of the plurality of light intensity distributions. |
