发明名称 PATTERN INSPECTION METHOD AND PATTERN INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To exclude an influence of adjacent stripe areas when images are acquired per stripe area by scanning a laser beam or an electron beam.SOLUTION: An inspection method includes: a step of acquiring images of patterns in respective first stripe groups each of which does not include adjacent stripe areas out of a plurality of stripe areas into which an inspection area of a sample is divided like strips so that the stripe areas partially overlap, in a lengthwise direction of the stripe areas by using a laser beam or an electron beam; and a step of, after acquisition of images of patterns in all stripe areas in the first stripe area groups, acquiring images of graphic patterns laid out within stripe areas in respective second stripe area groups each of which does not include adjacent stripe areas, out of remaining stripe area groups in the lengthwise direction of the stripe areas by using a laser beam or an electron beam.
申请公布号 JP2014163775(A) 申请公布日期 2014.09.08
申请号 JP20130034498 申请日期 2013.02.25
申请人 NUFLARE TECHNOLOGY INC 发明人 ISOMURA IKUNAO
分类号 G01N21/956;G01N23/225 主分类号 G01N21/956
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