| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for manufacturing a pattern film, which is capable of manufacturing the pattern film having a high accurate stripe pattern by making the vibration amplitude difference between a mask and a film smaller.SOLUTION: A film 16 is wound around conveyance rollers such as a backup roller 28, an upstream side roller 29, and a downstream side roller 30, to be continuously conveyed and irradiated with illumination light from a light source part 34 through a mask plate 46, so that a stripe pattern is exposed. A base for a mask 36 holding a mask unit 35 is supported by a base for the backup roller 31, so that the mask plate 46 and the film 16 supported by the backup roller 28 are vibrated in the same phase and the vibration amplitude difference between both is made smaller. Thus, an exposure blur area caused by the vibration amplitude difference between the film 16 and the mask plate 46 is made smaller. |
