发明名称 MANUFACTURING METHOD OF POLYCRYSTAL SILICON
摘要 PROBLEM TO BE SOLVED: To solve a problem that a Siemens method generally used for manufacturing polycrystal silicon has a low yield of polycrystal silicon and lacks effective means for reusing a large amount of tetrachlorosilane a byproduct.SOLUTION: A manufacturing method of polycrystal silicon to solve the problem includes a preceding step mainly composed of a Siemens method and a post-step mainly composed of a zinc reduction method to use as a raw material tetrachlorosilane a byproduct in the preceding step.
申请公布号 JP2014162688(A) 申请公布日期 2014.09.08
申请号 JP20130035751 申请日期 2013.02.26
申请人 JNC CORP;JX NIPPON MINING & METALS CORP;TOHO TITANIUM CO LTD 发明人 NAMIKI NOBUAKI;HONDA SHIYUUICHI
分类号 C01B33/033;C01B33/035 主分类号 C01B33/033
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