| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that is advantageous in improvement in production.SOLUTION: An exposure device comprises: a stage moved with a base plate held thereon; a measuring section configured to measure at a first measuring point and a second measuring point the height of the place of a measurement target in a shot area of the base plate held on the stage; and a control section configured to control an exposure process in which the base plate is exposed in an exposure area. A period of time that the stage is moved in order to expose one shot area of the base plate includes an acceleration period for which the movement of the stage is accelerated, and a uniform speed period for which the stage is moved at a uniform speed. Based on a correction result PL6 obtained by correcting the height of the place of the measurement target, measured at the first measurement point by the measurement section during the acceleration period, by use of a set correction value, the control section moves the stage in the height direction of the base plate. If the height of the place of the measurement target, measured at the second measurement point by the measurement section during the uniform period, deviates from a permissible range, the control section acquires a new correction value replacing the set correction value. |
