CERAMIC SHOWERHEAD WITH EMBEDDED RF ELECTRODE FOR CAPACITIVELY COUPLED PLASMA REACTOR

摘要

A shower head assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is closely connected to the first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to at least one conductor. A gas plenum is defined between the back plate and the face plate and is connected with a gas channel in order for a fluid to flow. The back plate and the face plate are made of a non-conductive material.