发明名称 SUBSTRATE CLEANING APPARATUS AND METHOD USING SAME
摘要 <p>The present invention relates to a cleaning brush assembly for a substrate cleaning apparatus. The cleaning brush assembly, used in a substrate cleaning apparatus for cleaning a substrate by a cleaning member in contact with the substrate, comprises the cleaning member formed of a material with elasticity on a contact surface in contact with the substrate; and a plurality of pressure chambers which is disposed on the bottom surface of the cleaning member, is formed to be able to expand, and protrudes a part of the cleaning member to the radial direction according to the expansion. The cleaning brush assembly for the substrate cleaning apparatus can completely remove foreign substances remaining on the substrate by wiping the foreign substances with a higher frictional force of the protruded area of the cleaning member.</p>
申请公布号 KR101438359(B1) 申请公布日期 2014.09.05
申请号 KR20130067546 申请日期 2013.06.13
申请人 K.C.TECH CO., LTD. 发明人 CHO, MOON GI;SON, JUN HO
分类号 H01L21/302 主分类号 H01L21/302
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