ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

Provided is an illumination optical system which illuminates a surface to be illuminated with light beams emitted from a plurality of light sources. The illumination optical system comprises: a plurality of optical systems arranged in correspondence with each of the light sources; a synthesis system for guiding the light from the optical systems to the surface to be illuminated and a conjugate plane that is optically conjugated; and an illumination system arranged between the conjugate plane and the surface to be illuminated. For a plurality of illumination areas formed on the conjugate plane by the light from each of the light sources through the optical systems and the synthesis system, the areas have a shape of non-circular. The optical systems and the synthesis system are also configured to be accommodated in an effective area of the conjugate plane. The effective area is an area in which the illumination system can introduce the light for the illumination of the surface to be illuminated among the areas of the conjugate plane.