| 摘要 |
The present invention relates to a twister spraying system. More particularly, the present invention relates to a twister spraying system for fine cleaning which may remove fine pollution particles such as fine impurities generated during a touch screen panel (TSP) manufacture and fine impurities generated during a photography process of a wafer by injecting a mixed fluid obtained by previously mixing a micro bubble and deIonized water (DIW) and clean dried air (CDA) to mix the mixed fluid and the CDA at high pressure in a twister scheme. The twister spraying system for injecting steam and fluid fine cleaning to a twister nozzle module includes a first injection line to inject a CDA to the twister nozzle module; a second injection line to inject a mixed fluid obtained by mixing a micro bubble and deIonized water (DIW) and clean dried air (CDA) to the twister nozzle module; a third injection line to inject steam to the twister nozzle module; a mixer to generate the mixed fluid; and a buffer tank to store the mixture fluid generated from the mixer for supplying the mixed fluid through the second injection line. |
