发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A transistor or the like having high field-effect mobility is provided. A transistor or the like having stable electrical characteristics is provided. A semiconductor device including a first oxide semiconductor layer, a second oxide semiconductor layer, a gate insulating film, and a gate electrode which partly overlap with one another is provided. The second oxide semiconductor layer is positioned between the first oxide semiconductor layer and the gate insulating film. The gate insulating film is positioned between the second oxide semiconductor layer and the gate electrode. The first oxide semiconductor layer has fewer oxygen losses than those of the second oxide semiconductor layer.</p>
申请公布号 KR20140108120(A) 申请公布日期 2014.09.05
申请号 KR20140015684 申请日期 2014.02.11
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TOKUNAGA HAJIME;HANDA TAKUYA;OKAZAKI KENICHI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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