APPARATUS OF ATOMIC LAYER DEPOSITION

摘要

The present invention relates to an apparatus for depositing an atomic layer. The apparatus can uniformly deposit the atomic layer on nanoparticles by generating turbulence. According to an embodiment of the present invention, the apparatus for depositing an atomic layer may include a chamber on which a plurality of fuzzy gas inlets, arranged on different horizontal locations, are formed; a pump which transfers fluid existing in the chamber; a water valve which is located between the chamber and the pump and can adjust a flux of the fluid; a flux adjusting part which adjusts influx time and the flux of fuzzy gas entering into the fuzzy gas inlets; and a controlling part which controls the pump, the valve, and the flux adjusting part.