MICROELECTRONIC SUBSTRATE CLEANING COMPOSITIONS HAVING COPPER/AZOLE POLYMER INHIBITION

摘要

Semi-aqueous, alkaline microelectronic cleaning composition of pH≧8 containing:
(A) at least one secondary alkanolamine that generates hydroxides when in contact with water;(B) at least one organic alcohol ether solvent having an evaporation rate of 0.3 or less when n-butyl acetate's evaporation rate is taken as the baseline rate of 1.0;(C) at least one corrosion inhibiting cyclic amide compound;(D) at least one pH balancing azole metal corrosion inhibitor in an amount of 0.08% or less by weight of the composition; and(E) water;

and optionally
(F) at least one polyhydroxylated phenol compound corrosion inhibitor; and(G) at least one polyalcohol or polythiol surface modification agent containing vicinal hydroxyl or vicinal sulfhydryl groups to pair with the polyhydroxylated phenol compound corrosion inhibitor.

主权项

1. A semi-aqueous, alkaline microelectronic cleaning composition of pH>8 comprising:
(A) at least one secondary alkanolamine that generates hydroxides when in contact with water; (B) at least one organic alcohol ether solvent having an evaporation rate of 0.3 or less when n-butyl acetate's evaporation rate is taken as the baseline rate of 1.0; (C) at least one corrosion inhibiting cyclic amide compound; (D) at least one pH balancing azole metal corrosion inhibitor in an amount of 0.08% or less by weight of the composition; and (E) water; and optionally (F) at least one polyhydroxylated phenol compound corrosion inhibitor; and (G) at least one polyalcohol or polythiol surface modification agent containing vicinal hydroxyl or vicinal sulfhydryl groups to pair with the at least one polyhydroxylated phenol compound corrosion inhibitor with the proviso that if component (F) is present in the compositions then component (G) is also present but, the compositions may contain component (G) without having component (F) present.