发明名称 |
METAL-OXIDE-METAL CAPACITOR |
摘要 |
Provided is a capacitor of a semiconductor device. The capacitor can includes a plurality of parallel lower conductive lines in parallel and a plurality of upper conductive lines on the lower conductive lines. Each lower conductive line can have a line width that is different than that of the upper conductive line adjacent to it. |
申请公布号 |
US2014246754(A1) |
申请公布日期 |
2014.09.04 |
申请号 |
US201313802997 |
申请日期 |
2013.03.14 |
申请人 |
DONGBU HITEK CO., LTD. |
发明人 |
KIM Su Tae |
分类号 |
H01L49/02 |
主分类号 |
H01L49/02 |
代理机构 |
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代理人 |
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主权项 |
1. A metal-oxide-metal (MOM) capacitor, comprising:
a plurality of lower conductive lines formed in parallel with one another at a first horizontal level; and a plurality of upper conductive lines formed in parallel with one another at a second horizontal level and vertically on the lower conductive lines; wherein each lower conductive line has a line width that is different from that of the upper conductive line adjacent to it; wherein each upper conductive line has a line width that is different from that of the lower conductive line adjacent to it; wherein a line width of each conductive line is different from that of any adjacent conductive line at the same horizontal level; and wherein each conductive line is not directly connected with any adjacent conductive line. |
地址 |
Seoul KR |