发明名称 METAL-OXIDE-METAL CAPACITOR
摘要 Provided is a capacitor of a semiconductor device. The capacitor can includes a plurality of parallel lower conductive lines in parallel and a plurality of upper conductive lines on the lower conductive lines. Each lower conductive line can have a line width that is different than that of the upper conductive line adjacent to it.
申请公布号 US2014246754(A1) 申请公布日期 2014.09.04
申请号 US201313802997 申请日期 2013.03.14
申请人 DONGBU HITEK CO., LTD. 发明人 KIM Su Tae
分类号 H01L49/02 主分类号 H01L49/02
代理机构 代理人
主权项 1. A metal-oxide-metal (MOM) capacitor, comprising: a plurality of lower conductive lines formed in parallel with one another at a first horizontal level; and a plurality of upper conductive lines formed in parallel with one another at a second horizontal level and vertically on the lower conductive lines; wherein each lower conductive line has a line width that is different from that of the upper conductive line adjacent to it; wherein each upper conductive line has a line width that is different from that of the lower conductive line adjacent to it; wherein a line width of each conductive line is different from that of any adjacent conductive line at the same horizontal level; and wherein each conductive line is not directly connected with any adjacent conductive line.
地址 Seoul KR