发明名称 |
Electrically controlled light attenuator for laser annealing of targeted prosecuting missile, has upper and lower layers of doped semiconductor material that are switched when electric voltage is applied by inducing charge carriers |
摘要 |
<p>The attenuator (30) has a layer stack (10) with an upper layer (12) of doped semiconductor material, an insulating layer (16) and a lower layer (20) of doped semiconductor material. The upper and lower layers of doped semiconductor material are switched when electric voltage is applied by inducing charge carriers from transmissive state in which the charge carriers are transparent to radiation in predetermined wavelength range and absorptive state in which the charge carriers absorb radiation of specific wavelength range. The semiconductor material is silicon.</p> |
申请公布号 |
DE10017834(A1) |
申请公布日期 |
2014.09.04 |
申请号 |
DE2000117834 |
申请日期 |
2000.04.11 |
申请人 |
DIEHL BGT DEFENCE GMBH & CO. KG |
发明人 |
BÜTTNER, KURT |
分类号 |
G02F1/015 |
主分类号 |
G02F1/015 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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