发明名称 Electrically controlled light attenuator for laser annealing of targeted prosecuting missile, has upper and lower layers of doped semiconductor material that are switched when electric voltage is applied by inducing charge carriers
摘要 <p>The attenuator (30) has a layer stack (10) with an upper layer (12) of doped semiconductor material, an insulating layer (16) and a lower layer (20) of doped semiconductor material. The upper and lower layers of doped semiconductor material are switched when electric voltage is applied by inducing charge carriers from transmissive state in which the charge carriers are transparent to radiation in predetermined wavelength range and absorptive state in which the charge carriers absorb radiation of specific wavelength range. The semiconductor material is silicon.</p>
申请公布号 DE10017834(A1) 申请公布日期 2014.09.04
申请号 DE2000117834 申请日期 2000.04.11
申请人 DIEHL BGT DEFENCE GMBH & CO. KG 发明人 BÜTTNER, KURT
分类号 G02F1/015 主分类号 G02F1/015
代理机构 代理人
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