发明名称 FILM-FORMING DEVICE AND INJECTOR
摘要 A film-forming device provided with a transportation mechanism for transporting a substrate during film-forming, an injector unit in which a plurality of injectors for feeding a film-forming gas toward the substrate are provided along the path of transportation of the substrate, and a reaction substance feed unit for generating a reaction substance. The injector unit feeds the reaction substance from gaps between the injectors to layers of film-forming components. The substrate-facing surfaces of the injectors have: film-forming gas feed ports for outputting the film-forming gas; first gas exhaust ports for suctioning excess film-forming gas and other gases, the first gas exhaust ports being provided on both sides of the direction of transportation of the substrate in relation to the film-forming gas feed ports; and inert gas feed ports for feeding an inert gas, the inert gas feed ports being provided on the side distanced from the film-forming gas feed ports in relation to the corresponding first gas exhaust ports.
申请公布号 WO2014132892(A1) 申请公布日期 2014.09.04
申请号 WO2014JP54177 申请日期 2014.02.21
申请人 MITSUI ENGINEERING & SHIPBUILDING CO., LTD. 发明人 HATTORI, NOZOMU;MIYATAKE, NAOMASA;MORI, YASUNARI
分类号 C23C16/455;H01L21/31;H05H1/46 主分类号 C23C16/455
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