| 摘要 |
The present invention relates to a plasma reactor for resolving gas and a gas scrubbing device equipped with the same and, more specifically, to a plasma reactor scrubbing exhaust gas by oxidizing the exhaust gas and generating oxidation effect maximally by installing electrodes respectively in a rotating body rotated by a driving means inside an exhaust gas pipe and in a gas pipe, and a gas scrubbing device equipped with the same. The present invention includes: a first electrode in a ring shape providing a pathway where gas passes through; a second electrode arranged inside the first electrode by keeping a distance from the first electrode; and a driving means for rotating at least one of the first or the second electrodes. The purpose of the present invention is to provide a plasma reactor capable of enlarging a contact surface of flame and exhaust gas by installing the plasma reactor inside the exhaust gas pipe, and maximally improving oxidation efficiency of the exhaust gas; and to provide a gas scrubbing device equipped with the same. |
