| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus excellent in utilization efficiency of film deposition material.SOLUTION: A film deposition apparatus 1 dissolves particulate material 3 being particulate film deposition material to deposit a film on a base material 2, and includes a feeding mechanism 21 feeding a film deposition position P of a base material 2 with particulate material 3, a treatment medium feeding mechanism 10 emitting a laser beam 15 for heating and fusing the film deposition material toward the film deposition position P of the base material 2, and a recovery mechanism 25 recovering the particulate material 3 having passed through the film deposition position P of the base material 2. |
