发明名称 |
RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY |
摘要 |
A resin having a fluorene structure, a relatively high carbon concentration in the resin, a relatively high heat resistance and a relatively high solvent solubility has a structure represented by;;wherein each of R3 and R4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone. The resin can be applied to a wet process. Methods for producing the resin, for forming an underlayer film useful for forming a novel resist, and for pattern forming using the material, and an underlayer film excellent in heat resistance and etching resistance for multilayer resist are described. |
申请公布号 |
US2014246400(A1) |
申请公布日期 |
2014.09.04 |
申请号 |
US201214348167 |
申请日期 |
2012.09.04 |
申请人 |
Higashihara Go;Uchiyama Naoya;Echigo Masatoshi |
发明人 |
Higashihara Go;Uchiyama Naoya;Echigo Masatoshi |
分类号 |
G03F7/09;G03F7/004 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
1. A resin having a structure represented by the following general formula (1): in the general formula (1), each of R3 and R4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone. |
地址 |
Kurashiki-shi JP |