发明名称 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
摘要 A mounting table includes an electrostatic chuck, a base, and a cylindrical sleeve. The electrostatic chuck has a top surface to be exposed to plasma and a bottom surface opposite to the top surface, and a first through-hole is formed through the electrostatic chuck. The base is bonded to the bottom surface of the electrostatic chuck by a first adhesive, and a second through-hole is formed through the base. The second through-hole communicates with the first through-hole and has a diameter larger than a diameter of the first through-hole. The sleeve is bonded to the bottom surface of the electrostatic chuck by a second adhesive while communicating with the first through-hole.
申请公布号 KR20140107279(A) 申请公布日期 2014.09.04
申请号 KR20147016724 申请日期 2012.12.17
申请人 TOKYO ELECTRON LIMITED 发明人 SASAKI YASUHARU;SUGAMATA TAKESHI;AOTO TADASHI
分类号 H01L21/683;C09J201/00;H01L21/3065 主分类号 H01L21/683
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