| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a closed-loop-type vapor deposition reaction vessel which performs a series of processes inside, which includes steps of: a source precursor or a reaction precursor being absorbed on a substrate; a physical adsorption molecular layer being desorbed; and the desorbed molecular layer being discharged to outside.SOLUTION: A vapor deposition reaction vessel includes at least one first injection part 11 which injects reaction material to a concavity part of a first part 10 of the vapor deposition reaction vessel. A second part 20 is connected to a first space part and has a concavity part connected to the concavity part of the first part. The concavity part of the second part is maintained to a state in which pressure is lower than that within the first space part. A third part 30 is connected to the second space part, and a discharge part 32 is connected to a third space part.</p> |
