| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing device not required to rotate a wafer in high speed, and a processing apparatus with the washing device.SOLUTION: A washing device 1 for washing a work piece, includes a washing table 10 holding the work piece on a holding surface 11a, and configured to be inverted upside down by rotation shafts 14, 15 extending parallel to the holding surface 11a and in a diameter direction of the holding surface 11a; and washing means 20 arranged below the washing table 10 to face the work piece held on the holding surface 11a facing downward, and washing the work piece by ejecting washing liquid. |
