发明名称 ILLUMINATION UNIT, PROJECTION DISPLAY UNIT, AND DIRECT VIEW DISPLAY UNIT
摘要 An illumination unit includes a plurality of light sources each including a solid-state light-emitting device configured to emit light from a light emission region including a single or a plurality of light-emitting spots. The solid-state light-emitting device includes a single chip or a plurality of chips each emitting light beam. Three or more of the light-emitting spots are provided within the whole light sources, to allow the whole light sources to emit light beams in two or more wavelength bands different from one another. Two or more of the plurality of the light sources include respective light-emitting spots which emit light in the same wavelength band.
申请公布号 US2014247591(A1) 申请公布日期 2014.09.04
申请号 US201414279885 申请日期 2014.05.16
申请人 Sony Corporation 发明人 Miura Koji
分类号 F21K99/00 主分类号 F21K99/00
代理机构 代理人
主权项 1. An illumination unit comprising: a plurality of light sources each including a solid-state light-emitting device configured to emit light from a light emission region including a single or a plurality of light-emitting spots; and an optical member having a minor axis and a major axis, and allowing incident light from the solid-state light-emitting device to pass therethrough, wherein the solid-state light-emitting device includes a single chip or a plurality of chips each emitting a light beam, wherein three or more of the light-emitting spots are provided within the whole light sources, to allow the whole light sources to emit light beams in two or more wavelength bands different from one another, wherein two or more of the plurality of the light sources include respective light-emitting spots which emit light in a same wavelength band, wherein one or more of the chips in the whole light sources include a laser diode, wherein the chip configured of the laser diode, in at least one of the plurality of light sources, includes a plurality of light-emitting spots, and wherein the second light source is configured to emit light beams of two or more different wavelengths, and wherein directions of major axes of the far field patterns of the light beams of two or more different wavelengths are substantially aligned with each other.
地址 Tokyo JP